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材料表面处理用强流电子回旋共振离子源 被引量:1

Electron cyclotron resonance ion source for material surface treatment
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摘要 介绍一台2.45GHz永磁强流电子回旋共振离子源,其外径160mm,高90mm,放电室直径70mm,高50mm。微波馈入采用介质耦合方式,微波窗由一块50mm×10mm柱形BN和两块30mm×10mm的柱形陶瓷构成。离子源工作在脉冲模式下,采用三电极引出系统,最高引出电压达到100kV,在微波输入功率300W、进气量0.4mL/min时,可引出峰值超过30mA的氮离子束,在距离离子源引出孔1200mm位置处的束流均匀区直径大于200mm。 A 2.45 GHz electron cyclotron resonance ion source with permanent magnets has been developed.Its outline dimension is 160 mm in diameter and 90 mm in height,the discharge chamber's dimension is 70 mm in diameter and 50 mm in hehight.The microwave window is made of a 50 mm×10 mm BN disk and two 30 mm×10 mm ceramic disks.This ion source adopts a three-electrode extraction system and works in the pulsed mode.When the microwave input power is 300 W,the air inflow is 0.4 mL/min,a more than 30 mA peak current of the nitrogen beam can be extracted from a 5 mm emission aperture at 100 kV extraction voltage.The diameter of the beam uniform area on the working plane is more than 200 mm.
出处 《强激光与粒子束》 EI CAS CSCD 北大核心 2012年第12期2911-2914,共4页 High Power Laser and Particle Beams
关键词 电子回旋共振离子源 微波窗 表面处理 引出系统 electron cyclotron resonance ion source microwave window surface treatment surface treatment extraction system
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参考文献18

  • 1Taylor T, Mouris J F. An advanced high-current low-emittance DC microwave proton source[J]. Nucl Instrum Methods , 1993, A336 : 1-5.
  • 2Sherman J , Bolme G,Geisik C,et al. Status report on a DC 130 mA, 75 keV proton injector[J]. Rev Sci Instrum , 1998,69(2) : 1003-1008.
  • 3Celona L,CiavolaG, Gammino S. Trips: the high intensity proton source for the trasco project[J]. Rev Sci Instrum y2000,71(2) : 771-773.
  • 4Lagniel J M, Beauvais P Y, Bogard D,et al. Status and new developments of the high intensity electron cyclotron resonance source light ioncontinuous wave,and pulsed mode[J]. Rev Sci Instrum,2000,71(2) ? 830-835.
  • 5Gobin R,Charruau G,Delferriere 0,et al. Development of a permanent magnet light ion source at CEA/Saclay[J], Rev Sci Instrum , 2006.77: 03B502.
  • 6Wills JSC, Lewis R A, Diserens J, et al. A compact high-current microwave-driven ion source[J]. Rev Sci Instrum , 1998,69(1) : 65-68.
  • 7宋执中,明建川,于金祥,王忠义,郭之虞.永磁强流ECR离子源[J].原子能科学技术,2004,38(z1):50-53. 被引量:6
  • 8崔保群,蒋渭生,孙汉城.紧凑型强流ECR源[J].原子能科学技术,2000,34(3):262-265. 被引量:1
  • 9Brown I G. Vacuum arc ion source[J], Rev Sci Instrum ,1994.6S(10) : 3061-3081.
  • 10Tokiguchi K,Seki T,Ito J,et al. High-current microwave ion source for wide-energy-range 0+ ion implantationQ]. Rev Sci Instrum,2000,71(2): 952-954.

二级参考文献14

  • 1[1] Sakudo N. Microwave Ion Source for Material Processing [J]. Rev Sci Instrum, 1998, 69(2): 825~830.
  • 2[2] Coeur FL, Lagarde T, Pelletier J, et al. Distributed Electron Cyclotron Resonance Plasma Immersion for Large Area Ion Implantation [J]. Rev Sci Instrum, 1998, 69(2):831~836.
  • 3[3] Sekiguchi M, Matsushita H, Jonoshita I, et al. Development of a 2.45 GHz Electron Cyclotron Resonance Ion Source for Ion Implanter Application [J]. Rev Sci Instrum, 1998, 69(2):1 003~1 008.
  • 4[4] Sherman J, Arvin A, Hansborough L,et al. Development of a 130 mA, 75 kV High Voltage Column for High-intensity DC Proton Injectors [J]. Rev Sci Instrum, 1998,69(2):1 017~1 019.
  • 5[5] Wills JSC, Lewis RA, Diserens J, et al. A Compact High Current Microwave Driven Ion Source[J]. Rev Sci Instrum, 1998,69(1):65~68.
  • 6[6] Taylor T, Wills JSC. A High Current Low Emittance DC ECR Proton Source [J]. Nucl Instrum Methods, 1991, A309:37~42.
  • 7[1]Taylor T,Wills JSC. A High Current Low Emittance DC ECR Proton Source[J]. Nucl Instrum Methods, 1991,A 309:37~42.
  • 8[2]Taylor T,Mouris JF. An Advanced High-current Low-emittance DC Microwave Proton Source[J].Nucl Instrum Methods,1993,A 336: 1~5.
  • 9[3]Sherman J,Arvin A, Hansborough L,et al. Status Report on a DC 130 mA, 75 keV Proton Injector[J]. Rev Sci Instrum, 1998,69(2) : 1 003~ 1 008.
  • 10[4]Lagniel JM,Beauvais PY,Bogard D,et al. Status and New Developments of the High Intensity Electron Cyclotron Resonance Source Light Ion Continuous Wave and Pulsed Mode[J]. Rev Sci Instrum, 2000,71 (2): 830 ~ 835.

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