化学混凝去除半导体机械研磨废水浊度的实验研究

Experimental Study on Wastewater Turbidity in Semiconductor Mechanical Attrition by Chemical Coagulation

本实验以各类混凝剂(硫酸铝、三氯化铁、多元氯化铝)进行化学混凝,探讨各条件对机械研磨废水浊度处理效果的影响。由结果可知,各种混凝剂加药量在特定的浓度范围下,去除浊度能力都可达到10NTU以下,当在适当浓度范围外时反而会使浊度变差。同时,pH值的配合,可以使加药量减少,达到低浊度的目的。

This study explores the effect of all types of coagulation on wastewater turbidity in mechanical attrition treatment based on chemical coagulation （mainly aluminum sulfate,ferric chloride and aluminum chloride multi-）. The results show that the ability to remove turbidity can be reached to 10 NTU under a particular area of concentration by adding dosage of coagulants,while beyond the appropriate concentration the turbidity removal will be changed into a poor state. At the same time,the low turbidity can be achieved when the dosage is reduced with the help of PH value.