化学溶液沉积法制备Pb_(0.5)Ba_(0.5)TiO_3薄膜的结构及电学性能研究

Structural and Electrical Properties of Pb_(0.5)Ba_(0.5)TiO_3 Thin Film Using a Chemical Solution Deposition Method

采用化学溶液沉积法在Pt/TiO2/SiO2/Si基片上制备钛酸铅钡Pb0.5Ba0.5TiO3(PBT)薄膜。薄膜呈纯钙钛矿结构,无杂相生成。此外,薄膜表面光滑致密、没有微裂痕.薄膜得到的晶粒尺寸较小,约为17 nm。在700℃1 h退火的薄膜有良好的电学特性,在1 kHz频率下测量得到的介电常数、损耗因子分别约为265和5%;此外,在500 kV/cm电场驱动下,薄膜得到的剩余极化(2Pr)约为16μC/cm2,矫顽电场(Ec)约为110 kV/cm。这些结果表明,PBT固溶体薄膜有望成为铁电器件的候选材料。

Pb0. 5Ba0. 5TIO3（PBT） thin films were prepared on Pt/TiO2/SiO2/Si substrates by using a chemical solution deposition method. The thin films were phase-pure with perovskite structure, no secondary phase was observed. Meanwhile, they were smooth, density and crack-free with small grain size of about 17 nm. Good electrical properties were observed in the films annealed at 700 ℃ for 1 h. The dielectric constant and the dissipation factor （ at 1 kHz） were 265 and 5 %, respectively. Driven by a electric field of 500 kV/cm, PBT showed 2 Pr of and Ec of 110 kV/cm. These suggested that PBT had potentials in applications of ferroelectric devices.