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Electron interaction and localization in ultrathin topological insulator films

Electron interaction and localization in ultrathin topological insulator films
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摘要 In this article we review recent transport property studies on topological insulator thin films grown by molecular beam epitaxy.In pure Bi2Se3 ultrathin films we find an insulating ground state in the presence of weak antilocalization,which indicates the relevance of electron interaction effect.In magnetically doped Bi2Se3 film we observe a systematic crossover between weak localization and weak antilocalization with varied magnetic doping,temperature,and magnetic field.These results demonstrate the intricate interplay between topological delocalization,electron interaction,and broken time reversal symmetry in topological insulator thin films. In this article we review recent transport property studies on topological insulator thin films grown by molecular beam epitaxy.In pure Bi2Se3 ultrathin films we find an insulating ground state in the presence of weak antilocalization,which indicates the relevance of electron interaction effect.In magnetically doped Bi2Se3 film we observe a systematic crossover between weak localization and weak antilocalization with varied magnetic doping,temperature,and magnetic field.These results demonstrate the intricate interplay between topological delocalization,electron interaction,and broken time reversal symmetry in topological insulator thin films.
出处 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2012年第12期2213-2225,共13页 中国科学:物理学、力学、天文学(英文版)
基金 supported by the National Natural Science Foundation of China(Grant Nos.10834003,10911130233) the Ministry of Science and Technology of China(Grant No.2009CB929400) the Chinese Academy of Sciences
关键词 topological insulator transport property surface state LOCALIZATION electron interaction 电子相互作用 超薄膜 绝缘体 拓扑 本地化 超薄型 分子束外延生长 时间反演对称性
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