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基于表面势的氢化非晶硅薄膜晶体管直流特性研究

DC characteristic research based on surface potential for a-Si:H thin-film transistor
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摘要 基于表面势模型,在同时考虑深能态和带尾态分布下,采用简化的费米-狄拉克函数计算得到统一的定域态模型,并利用有效特征温度的概念,推导出a-Si:H TFT统一的电流-电压(I-V)模型.该模型可不分区地描述包括亚阈值区、线性区以及饱和区等a-Si:H TFT的所有工作区域.与实验得到的I-V特性进行比较表明,本模型能够准确地描述a-Si:H TFT的各个工作区的电流电压特性. In this paper, based on the surface potential model, taking into account both the deep and tail state distributions simultaneously, and using the simplified Fermi-Dirac function, a unified local-state model is obtained. Using the effective characteristic temperature, the unified current-voltage (l-V) model for a-Si : H thin-film transistor a-Si : H TFT is developed. This model can describes all operating regions including subthreshold region, linear area and saturated zone through a single equation. By comparison with the experimental data, it is shown that this model can accurately describe the current voltage characteristic of the a-Si : H TFT.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2012年第23期416-421,共6页 Acta Physica Sinica
基金 国家自然科学基金(批准号:61274085)资助的课题~~
关键词 非晶硅 表面势 薄膜晶体管 有效特征温度 a-Si, surface potential, TFT, effective characteristic temperature
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参考文献13

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