期刊文献+

多频激励信号对离子能量分布的影响 被引量:2

Effects on ion energy distribution of multiple frequencies' driven
下载PDF
导出
摘要 在等离子体多频电容放电过程中不同频率的电压、谐波、频率、是如何影响离子的能量分布,分析和把握这种现象和成因机制,对于更好地控制集成电路蚀刻等微处理技术,以及对等离子体物理基础理论研究均有重要作用。着重讨论高低频(双频)激励电容耦合放电过程中的粒子能量分布函数(IEDs),从理论分析推导出多频激励信号的离子能量分布函数计算模型。通过该计算模型可以分析和预测不同高低频激励的离子能量分布,计算结果与目前国内外公开发表学术期刊研究的相关结论基本吻合。 It is important to analyze the phenomenon and of the way the vo]tages, resonant and frequencies influence are on the ion energy distributions (IEDs) from multiple frequencies driven in capacitive dis- charges in order to control the microelectronic processes of integrated circuit and develop the base theories of plasma physics. The paper focuses on the function of the ion energy distributions under high and low frequencies ( dual fre- quency) drive in capacitive discharges and derived a model of computation of the multiple frequencies driven IEDs from analyzing theories. The model can analyze and predict the IEDs under different high and low frequencies driven, the results from the model are in good agreement with the important data in public magazines.
出处 《贵州师范学院学报》 2012年第9期13-17,共5页 Journal of Guizhou Education University
基金 贵州省教育厅科研项目(黔教科2010053) 贵州省科技厅科技基金(黔科合丁字20122291号)
关键词 多频电容放电 离子能量分布 调制信号 高低频率 计算模型 multiple frequencies capacitive discharge ion energy distributions (IEDs) resonance wave highand low frequencies computational model
  • 相关文献

参考文献1

二级参考文献20

  • 1Kim H C, Lee J K and Shon J W 2005 Phys. Plasmas 104545.
  • 2Hass F A 2004 J. Phys. D: Appl. Phys. 37 3117.
  • 3Robiche J, Boyle P G, Turner M M and Ellingboe A R 2003 J. Phys, D: Appl, Phys. 36 1810.
  • 4Boyle P C, Robiche jr and Turner M M 2004 J. Phys. D:Appl. Phys. 37 1451.
  • 5Shannon S, Hoffman D, Yang J G, Paterson A and Holland J 2005 J, Appl, Phys. 97 103304.
  • 6Georgieva V, Bogaerts A and Gijbels R 2003 J. Appl. Phys.94 3748.
  • 7Salabas A and Brinkmann R P 2005 Plasma Sources Sci.Technol. 14 853.
  • 8Kim H C and Lee J K 2005 Phys. Plasma 12 053501.
  • 9Myers F R and Cale T S 1992 J. Electrvchem. Soc. 1393587.
  • 10Kim H C and Manousiouthakis V I 1998 J. Vac. Sci. Technol, A 16 2162.

同被引文献7

  • 1M. A. Lieberman, A. J. Lichtenberg. Principles of Plasma Discharges and Materials Processing: 2nd ed [ M ]. New York : Wiley - Interscience,2005.
  • 2http://www.baike.com/wiki/惰性气体.
  • 3http://so.baike.com/s/doc/114号元素.
  • 4http://www.doc88.com/p-7773986013772.html.
  • 5M. A. Lieberman and A. J. Lichtenberg, Principles of. Plasma Discharges and Materials Processing M ] ( 2nd de).
  • 6An analyfieal model of computiny ion energy distributous for mulitple frequencies capacititve dischurges [ J ]. Wiloy, 2005.
  • 7陈心园,黄建,邓伟,王维,周筑文.模拟分析SiH_4和N_2O产生等离子体加强化学沉积制备SiO_2薄膜[J].贵州师范学院学报,2014,30(9):75-79. 被引量:3

引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部