化学气相沉积法制备大面积石墨烯及其光谱学表征

Prepared Large Area Graphene by Chemical Vapor Deposition and Characterized its Spectral

化学气相沉积（CVD）法是近年来发展起来的制备石墨烯的新方法。该方法产物具有生长面积大、质量高等优点，逐渐成为制备石墨烯的主要方法。用CVD法在常压下通过全面优化实验参量，以镍箔为基底制备了大面积少数层和单层石墨烯，用拉曼光谱，场发射扫描电子显微镜（SEM）和原子力显微镜（AFM）手段表征，通过分析常压下不同温度、不同载气成分比等实验参数，最终获得制备高质量、大面积、少数层石墨烯的最佳参量，用双共振理论解释少数层和单层石墨烯的拉曼光谱中2D峰强度随石墨烯层数变化而变化的原理。CVD法制备的石墨烯具有面积大、低成本、可测量性强、可用于大批量生产的优点，为工业用途石墨烯的制备提供了有效途径。

Chemical vapor deposition is a new developed method to Synthesis graphene recently. By this method, its products has advantages of large growth area, good quality, etc, and becomes the main method to prepare graphene. Optimized the experimental parameters under atmospheric pressure, and taken Nickel as the substrate ,synthesized large area graphene with few layers and monolayer graphene by CVD. The prepared graphene were characterized by Raman, SEM and AFM. Through analyzing the quality of graphene prepared by different temperature and carrier gas composition, found the proper synthesize parameters for preparing large area, high quality and few layers graphene. Dual-resonance theory was used to explain principles of the intensity of 2D peak changed with the layer of the graphene in Raman spectroscopy. The graphene prepared by CVD method has the advantages of large area, low costs, highly measurable and could be prepared in high volume. The study provided an effective way for to prepared large area and high quality graphene for industry.