高纯度没食子酸的研究

Study on the High-Purity Gallic Acid

以工业没食子酸为原料 ,分析了其中所含杂质及存在的形式 ,提出了分离和纯化过程机理 ,采用离子交换树脂处理方法 ,研制出了适合微电子工业使用的高纯度没食子酸。结果表明 ,样品中所含各种金属离子均≤ 0 .1mg/kg ,没食子酸含量≥99 5%

An analysis is made to fine out the impurities and their existing forms in the industrial gallic acid.According to the principles of separation and purfication,a treatment method of exchanging resin for ion is used to prepare high purity gallic acid for the microelectronic industrial purposes.The results show that each metal iron in the sample product is less than 0.1 mg/kg and its purity is over 99.5%.