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GaAs功率单片脉冲在片测试技术研究 被引量:2

Research of On-wafer Pulse Testing of GaAs Power Amplifier MMIC
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摘要 讨论了功率单片在片脉冲测试中在片校准技术、脉冲功率测试技术等难题,并在讨论以上问题的基础上,实现工程化应用,该测试技术能够有效覆盖至40GHz。在建立的脉冲大功率在片测试系统上对输出功率典型值5W的GaAs功率单片放大器进行测试验证,测试结果和装架测试结果相比较,输出功率误差<0.2dB。 In this paper some key techniques of power amplifier microwave on-wafer testing are discussed including on-wafer testing calibration technique ,pulse power on-wafer testing tech- nique, these techniques have been applied to 40 GHz in practice. Based on these techniques, pulse on-wafer testing system has been set up. The difference output power of a 5 W amplifier tested between by using on-wafer pluse testing system and in-package testing system is less than 0. 2 dB.
出处 《固体电子学研究与进展》 CAS CSCD 北大核心 2012年第6期579-583,共5页 Research & Progress of SSE
关键词 在片测试 脉冲功率测试 在片校准技术 on-wafer testing pulse power testing on wafer calibration technique
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参考文献5

  • 1Ian Robertson, Stepan Lucyszyn. RFIC and MMICDesign and Technology [M]. UK: The IEE, 2001:388-397.
  • 2Teyssier J P,Viaud J P, Raoux J J, et al. Fully inte-grated nonlinear modeling and characterization systemof microwave transistors with on-wafer pulsed mea-surements [C]. IEEE MTT-S Micr Symp Dig,1995:1033-1036.
  • 3Recommendations for Testing High-Power Amplifiers(Agilent Technologies ) , h.ttp://www. agilent. com,2005.
  • 4Pulsed-RF S-Parameter Measurements Using Wide-band and Narrowband Detection ( AgilentTechnologies),http : //www. agilent. com,2008.
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