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利用真空变温电阻测试仪研究VO_2薄膜的电阻特性

Research on the temperature dependent resistance of VO_2 thin film in vacuum
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摘要 利用磁控溅射技术在普通玻璃基片上制备了VO2薄膜,晶体结构和表面形貌分析表明制备的样品主要具有VO2相,结晶情况良好.利用自制真空变温薄膜电阻测试仪器测试了VO2薄膜的电阻率随温度变化曲线,观察到钒氧化物的电阻突变和热滞现象. VO2 thin films were deposited Structural and surface topographical analysis The resistivity of VO2 thin film was measured vacuum and under varying temperatures, and oxide were observed. on normal glass substrates by magnetron sputtering. indicated that the sample was finely-crystallized VO2. by self-made film resistance measurement instrument in the resistance saltation and heat stagnation in vanadium
出处 《物理实验》 2012年第12期1-4,47,共4页 Physics Experimentation
基金 中央高校基本科研业务费专项基金(No.2009JBM098) 北京市自然基金(No.2113050)
关键词 磁控溅射 VO2薄膜 电阻率 温度 magnetron sputtering VO2 thin film resistivity temperature
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  • 1柳文军,舒启清,马晓翠,S.M.Bhagat,S.E.Lofland,I.O.Troyanchuk.Doping-Induced Phase Transitions in Polycrystalline La0.49Sr0.51(Mn1-xNbx)O3[J].Chinese Physics Letters,2005,22(4):938-941. 被引量:3
  • 2Yamaguchi M, Ide-Ektessabi A, Nomura H, et al. Characteristics of indium tin oxide thin films prepared using electron beam evaporation [J]. Thin Solid Films, 2004,447-448:115-118.
  • 3Maruyama T, Fukui K. Indium-tin oxide thin films prepared by chemical vapor deposition [J]. J. Appl. Phys. , 1991,70:3 848-3 851.
  • 4Kim H, Gilmore C M, Pique A. Electrical, optical, and structural properties of indium-tin-oxide thin films for organic light-emitting devices [J]. J. Appl. Phys. , 1999,86:6 451-6 461.
  • 5Korotcenkov G, Brinzari V, Cerneavschi A, et al. The influence of film structure on In2O3 gas response [J]. Thin Solid Films, 2004,460:315-323.
  • 6Stoica T F, Teodorescu V S, Blanchin M G, et al. Morphology, structure and optical properties of sol-gel ITO thin films [J]. Mater. Sci. Eng. B, 2003, 101:222-226.
  • 7Hu Y, Diao X, Wang C, et al. Effects of heat treatment on properties of ITO films prepared by rf magnetron sputtering [J]. Vacuum, 2004,75: 183- 188.
  • 8Horstmann F, Sittinger V, Szyszka B. Heat treatable indium tin oxide films deposited with high power pulse magnetron sputtering [J]. Thin Solid Films, 2009,517:3 178-3 182.
  • 9Cruz L R, Legnani C, Matoso I G, et al. Influence of pressure and annealing on the microstructural and electro-optical properties of RF magnetron sputtered ITO thin films [J]. Materials Research Bulletin, 2004,39:993-1 103.
  • 10Park J O, Lee J H, Kim J J, et al. Crystallization of indium tin oxide thin films prepared by RF-magnetron sputtering without external heating [J]. Thin Solid Films, 2005,474 : 127-132.

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