172nm真空紫外光源的研制及驱动特性研究

Development of Novel Type of 172 nm Vacuum Ultraviolet Light Source

通过改进电极引出线以及氟化镁光窗的封接工艺，提高了真空紫外光源器件的可靠性，按照新的工艺流程设计并制作了新型172nm真空紫外光源。在此基础上为了提高真空紫外光源的效率，对方波脉冲及正弦波形激励下的真空紫外光源的放电特性以及辐射特性进行了分析与研究。研究结果表明，172nm真空紫外光源的辐射强度随气压、输入电压以及电源工作频率的升高而升高；采用方波驱动时器件的着火电压较低；在输入功率6．8～8．2W范围内，采用方波驱动时的真空紫外辐射强度是正弦波驱动时的5．5倍。

A novel type of 172 nm vacuum ultraviolet （VUV） light source was developed to improve its efficiency and reliability. The original work is the improvement of the electrode connectors and sealing of the magnesium fluoride window. The impact of the operating conditions including the waveforms of the driving voltage, input power and frequency, and pressure, on the characteristics of the discharge and light emission of the VUV light source were evaluated. The results show that the UV light emission intensity increases with the increases of the pressure, driving voltage and frequency. In addition,when it comes to low ignition voltage and high emission intensity, square-pulse outperforms sinusoidal voltage. For instance, driven by a square pulse at an input power of 6.8 - 8.2 W, the intensity is 5.5 times higher than that driven by a sinusoidal voltage.