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离子注入对洋葱表皮细胞形态的影响 被引量:2

EFFECT OF ION BEAM IMPLANTATION ON MORPHOLOGY OF EPIDERMAL CELLS OF ONION
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摘要 本文讨论了离子束与生物体相互作用动态分析仪的物理方案及参量设计,提出了由微波(2.45GHz)激发等离子体,放电室尺寸远小于TE或TM谐振模式的ECR离子源模式,采用永久磁铁的会切场磁场位形产生高密度的等离子体。利用二电极引出系统引出N^+离子流密度高达16mA/cm^2,总离子流1.1mA。通过聚焦,离子束斑直径为0.2mm,并进行了离子束与洋葱表皮细胞相互作用情况显微观察与摄影。 The pholess of ion beam dynamic implantation into plant cells is discussed in the present paper. ECR ion source were excited by microwave(2.45GHz), The discharge chamber diameter of ECR ion source to whichmicrowave were introduced by wave guide and vacuum window was smallerthan for TE modes. The magnetic structure was built with NdFeB permanentwhere the magenetization M is perpendicular with source axis. This cuspstructure could be used to produce N^+ ion current of 1.1 mA (ion currentdensity of 16 mA/cm^2) at an extraction voltage of 8kv with an apertureof 3mm diameter by a two grid system. Focused ion beam diameter was0.2mm.
出处 《安徽农学院学报》 CSCD 1991年第4期323-328,共6页
关键词 洋cong 表皮 细胞形态 离子注入 Epidermal cells of onion ECR N^+ implantation
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