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氯化物体系三价铬电镀新工艺及其镀层性能 被引量:4

Novel process for trivalent chromium plating in chloride system and properties of obtained chromium coatings
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摘要 开发了Trich-6861氯化物体系三价铬电镀新工艺。通过赫尔槽试验测得不同电流密度下的镀铬速率维持在0.077~0.181μm/min,且不随电镀时间延长而改变。镀层厚度在0.4μm以上,表面呈蓝白色,光滑、无裂纹,中性盐雾试验120h不变色,恒定湿热试验、冷热冲击试验、人造汗液测试和抗化学污染测试均合格。生产实践表明,该工艺镀液性能稳定,操作简单,便于维护,顾客满意度较高。 A novel Trich-6861 process for trivalent chromium plating in chloride system was developed. The deposition rate of the process measured by Hull cell test is 0.077-0.181 μm/min at different current densities, invariable with the extending of plating time. The chromium coating has a thickness of 0.4 μm or above, with blue-white, smooth, and crack-free surface, does not tarnish after neutral salt spray test for 120 h, and can pass the steady-state damp heat test, cold-heat shock test, artificial sweat test, and chemical contamination test. The production practice showed that the plating process has advantages of high bath stability, simple operation, and easy maintenance, and thus has earned a high customer satisfaction.
出处 《电镀与涂饰》 CAS CSCD 北大核心 2013年第1期18-20,共3页 Electroplating & Finishing
关键词 三价铬电镀 氯化物体系 沉积速率 耐蚀性 中性盐雾试验 trivalent chromium plating chloride system deposition rate corrosion resistance neutral salt spray test
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参考文献8

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二级参考文献17

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共引文献23

同被引文献36

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