高压退火对FePt:Ag纳米薄膜的微结构和矫顽力的影响

Effects of high pressure annealing on microstructure and coercivity of FePt: Ag nanocomposite thin films

采用直流磁控溅射技术在自然氧化的Si基片上生长厚度约为100nm的原始态FePt:Ag纳米复合薄膜,采用高压退火调控该薄膜的微结构和矫顽力。在873 K温度下,当退火压力从常压增加到0.6 GPa时,退火后所生成的L10-FePt薄膜的有序畴尺寸从d=19 nm减小到D=9 nm,FePt薄膜的晶粒尺寸从D=34 nm减小到D=13nm,且有序畴尺寸和晶粒尺寸分布的均匀性明显提高。随着退火压力的增加FePt:Ag薄膜的矫顽力降低,因此,高压退火可以用来调控FePt:Ag复合薄膜的矫顽力。

As-deposited FePt： Ag nanocomposite thin films with the thickness of about 100 nm are prepared on the naturally oxidized Si （001） substrate using the DC magnetron sputtering technique. High pressure annealing is used to mediate the microstructure and coercivity of the FePt： Ag films. The average size ofd=19 nm for the L10 Ordered domains and D=34 nm for the FePt grains are reduced to d=-9 nm and D=13 nm, respectively, and the size distribution is improved up to a narrower range with increasing pressure from ambient pressure to 0.6 GPa at 873 K, and the coercivity ofL10-FePt： Ag nanocomposite thin films is remarkably reduced.