4SWAIN G M.The susceptibility to surface corrosion in Acidic Fluodde Media:a comparison of diamond,HOPG and glassy carbon electrodes[J].J.Electrochem.Soc.,1994.141:3382-3393.
5RAMESHAM R,ROSE M F.Electrochemical characterization of doped and undoped CVD diamond deposited by microwave plasma[J].Diam.and Relat.Mater.,1997,6(1):17-27.
6GANDINI D,MAHE E,MICHAUD P A,et al.Oxidation of carboxylic acids at boron-doped diamond electrodes for wastewater treatment[J].J.Appl.Electrochetm.,2000,30(12):1345-1350.
7GRUEN D M.Nanocrystalline diamond film[J].Annual Review of Materials Science,1999,29:211-259.
8SONG Yang,SWAIN G M.The electrochemical remediation of atrazine using boron-doped diamond electrode on Ti substrate[C]//FRANKENMUTH M I.38th Central Regional Meeting of the American Chemical Society.Washington,D.C.:American Chemical Society,2006:16-20.
9GAUTIER D C,MuENCHAUSEN R E,JACOBSOHN L G,et al.Microwave plasma enhanced chemical vapor deposition of diamond in silicon pores[J].Diam.and Relat.Mater.,2005,14(2):220-225.
10CHEN Y J,YOUNG T F,LEE S L,et al.Electrochemical studies of nano-struetured diamond thin-film electrodes grown by microwave plasma CVD[J].Vacuum,2006,80(7):818-822.
