PbTe薄膜磁控溅射生长及其微结构研究

Growth and microstructural properties of PbTe thin film by magnetron sputtering

利用磁控溅射法在BaF2(111)单晶衬底上生长了PbTe薄膜,通过原子力显微镜(AFM)、X射线衍射(XRD)、傅里叶红外透射谱(FTIR)表征了溅射PbTe/BaF2(111)薄膜的微结构和光学特性.测量结果显示:溅射生长的PbTe/BaF2(111)薄膜表面由规则金字塔形岛和三角形坑组成的纳米颗粒构成,且薄膜沿<111>取向择优生长,其晶粒大小与表面纳米颗粒大小接近.室温下傅里叶红外透射谱及其理论模拟表明溅射生长的PbTe薄膜光学吸收带隙(Eg=0.351 eV)出现蓝移,与PbTe纳米晶粒的尺寸效应有关.

PbTe thin films were produced by magnetron sputtering on BaF2 （ 111 ） substrates . The microstruc- tural and optical properties of PbTe thin films were characterized by atomic force microscopy （ AFM ） , X-ray diffraction （ XRD ） and Fourier transform infrared spectroscopy （ FTIR ）. It was found that the nanoerystals with trigonal pyramids and pits were formed on the surfaces and grew in the （ 111 ） preferred orientation. The average nanoerystal sizes obtained from the AFM images were consistent with that measured from the XRD. The experimental and theoretical studies of the FTIR at room temperature showed the band gap energy （ Eg = 0.351 eV）of the PbTe film had a blue shift due to the grain size effect.