抗汞菌株的API20E鉴定及其质粒特性

API20E identification and plasmid characters of a mercury-resistance strain

利用API20E细菌鉴定系统对筛选获得的抗汞菌株PII进行鉴定,并采用高温-SDS对所获抗汞菌株PII进行质粒消除,研究其对PII菌株的去汞特性的影响。结果表明,抗汞菌株PII生化谱为2227004,经API20E生化项分析鉴定系统查询,为恶臭假单胞菌(Pseudomonas putida);抗汞菌株PII含有质粒,其质粒片段在4 kb～5 kb左右,利用高温-SDS法质粒消除率达到62.5%。质粒消除试验表明,抗汞菌株PII的汞去除能力与质粒相关。

API 20E was used to identify isolated strain PII, and Hg2＋ removal of PII was tested after plasmid elimination by high temperature and SDS. The results showed that the biochemical spectrum of PII was 2227004, and PII was identified as Pseudomonas putida by API20E; PII had plasmids, and its plasmid clips was 4 kb-5 kb; plasmid elimination rate by high temperature and SDS was 62.5%; the plasmid elimination test showed that the gene which decided strain PII to resist or remove mercury was on the plasmid.