摘要
用电子回旋共振等离子体化学汽相沉积 (ECRCVD)法 ,在单晶硅 (10 0 )衬底上沉积生长出了具有 { 2 2 1}结构特性的连续的结晶态 β C3N4 薄膜。使用扫描电镜 (SEM)观测了沉积薄膜的形态 ;采用X射线光电子光谱 (XPS) ,X射线衍射 (XRD)和拉曼散射表征薄膜的结构。研究表明 ,沉积结晶态 β C3N4 薄膜具有 { 2 2 1}结构特性。
A continuous and pure crystalline film of β C 3N 4 with {221} textured characteristic has been grown using an ECR CVD (electron cyclotron resonance plasma enhanced chemical vapor deposition) process. The morphology of the deposited films was observed using SEM (scanning electron microscopy). Chemical compositions and chemical states of elements in the deposited films were analyzed using XPS (X ray photoelectron spectroscopy), XRD (X ray diffraction) and Raman scattering were used to characterize the film structure.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2000年第3期224-228,共5页
Journal of Synthetic Crystals
基金
国家自然科学基金资助项目!(No .6 9876 0 0 3)
北京市自然科学基金资助项目!(No .2 982 0 13)