结晶β-C_3N_4薄膜的制备和特性研究(英文)

Preparation and Characterization of Crystalline β-C_3N_4 Films

用电子回旋共振等离子体化学汽相沉积 (ECRCVD)法 ,在单晶硅 (10 0 )衬底上沉积生长出了具有 { 2 2 1}结构特性的连续的结晶态 β C3N4 薄膜。使用扫描电镜 (SEM)观测了沉积薄膜的形态 ;采用X射线光电子光谱 (XPS) ,X射线衍射 (XRD)和拉曼散射表征薄膜的结构。研究表明 ,沉积结晶态 β C3N4 薄膜具有 { 2 2 1}结构特性。

A continuous and pure crystalline film of β C 3N 4 with {221} textured characteristic has been grown using an ECR CVD (electron cyclotron resonance plasma enhanced chemical vapor deposition) process. The morphology of the deposited films was observed using SEM (scanning electron microscopy). Chemical compositions and chemical states of elements in the deposited films were analyzed using XPS (X ray photoelectron spectroscopy), XRD (X ray diffraction) and Raman scattering were used to characterize the film structure.