摘要
用XPS结合AES、SEM、XRD分析研究了快速热退火形成的TiSi_2经100—1000℃、20—60 的热氧化行为.TiSi_2表面由SiO_2+ TiO_2组成的混合层随着氧化温度的升高或是氧化时间的延长向SiO_2层过渡.提出一个“氧化时间两个阶段”的模型解释了实验结果.
Thermal oxidation behaviour of TiSi_2 rapid thermal annealed at temperatures rangingfrom 100℃ to 1000℃ for 20-60 min is investigated by XPS in conjunction with AES,SEM and XRD. When the oxidation temperature or oxidation time is increased, TiSi_2 surfacetransform from a mixed layer consisting of SiO_2 and TiO_2. into SiO_2 A model-oxidationtime can be divided into two stages-is advanced,the experiment results can be explainedsuccessfully.
