摘要
光学光刻的生命力仍然在不断延续 ,即使在 0 13 μm及 0 13 μm以下集成电路制造水平上 ,光学光刻仍然是一个非常重要的候选者。深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。对深亚微米光学光刻中的一些关键工艺技术如移相光刻、光学邻近效应校正、远紫外光刻胶、套刻对准误差等进行了论述。
The vitality of optical lithography is still continuing.Even for 0 13μm Integrated Circuits(IC) and below,optical lithography is still a very important candidate.Deep?sub?micron optical lithography process is facing more and more serious challenge.In this paper,some important deep?sub?micron optical lithography processes such as phase?shifting mask、optical proximity correction、deep?UV resist、alignment errors are discussed.
出处
《电子工业专用设备》
2000年第3期8-12,共5页
Equipment for Electronic Products Manufacturing
关键词
移相掩模
光学邻近效应
远紫外光刻胶
对准
Phase-shift mask
Optical proximity correction
Deep-UV resist
Alignment
