纳米压印技术在LED器件制备中的应用

Application of Nanoimprint Lithography for the Fabrication of Light-Emitting Diodes

纳米压印技术(NIL)是一种机械制备纳米图形的微加工技术,它具有设备简单、易于操作、重复性好和成本低等优点。同时,它可以大面积制备高分辨率的纳米图形,使得大批量低成本地生产微纳器件成为可能。而固态照明工程目前是被全世界所关注的重要领域,制备出高效III-V化合物半导体发光二极管(LED)来代替现有的传统照明工具已经掀起了照明技术的革命,以实现高质量、绿色的照明。重点介绍了纳米压印技术的发展和工艺过程,并详细论述纳米压印技术在无机和有机LED制备中的应用,实现纳米结构LED以及表面光子晶体结构,从而提高LED的发光效率。

Nanoimprint lithography （NIL） is a nano-size scale fabrication technology which could fabricate patterns mechanically with such advantages as simple machines, easy operation, good repeatability and low costs. Meanwhile, it can achieve precise nanopatterns on whole 2-inch or 4-inch wafers （1 inch= 25.4 mm）, which makes it possible to fabricate nano-size optoelectronic devices with high throughput and low costs. On the other hand, solid state lighting using compound semiconductor materials is an attractive field both in academia and industry of the world. Highefficiency light-emitting diodes （LED） are taking place of traditional lighting sources, in order to realize high-quality, green lighting. This review covers the basic principles and process of nanoimprinting, with an emphasis on the application of nanoimprinting for the new inorganic and organic LED, achieving the nano-LED structures and photonic crystals to improve the efficiency of optoelectronic devices.