N_2流量对中频非平衡磁控溅射TiAlN薄膜结构及性能的影响

Influence of nitrogen flows on structure and properties of TiAlN film prepared by mid-frequency unbalanced magnetron sputtering

采用非平衡磁控溅射技术在AISI202不锈钢片和P(111)单晶硅基底上制备了TiAlN薄膜,并利用场发射扫描电镜(FESEM)、三维轮廓仪、X射线衍射仪(XRD)、X射线电子能谱仪(XPS)、纳米压痕仪对薄膜的结构和性能进行了考查。结果表明,随着N2流量的升高,TiAlN薄膜的沉积速率降低,Al/Ti比率先升高后迅速降低;薄膜主要由TiN立方晶构成,且随N2流量的升高晶粒尺寸减小,柱状晶结构变疏松。在氮气流量为20mL/min时,薄膜具有最高的硬度及结合力。

TiAlN films were deposited by mid-frequency unbalanced magnetron sputtering on stainless steel AISI202 and Si wafer P（111）.The structure and properties of the TiAlN films were investigated by atomic force microscopy,microXAM-3D surface profiler,X-ray diffraction,X-ray photoelectron spectroscopy and nanoindentation.With the nitrogen flows increasing the deposition of TiAlN films is decreasing,the Al/Ti ratio increasing first and then decreasing hardly.The films was made up of cubic crystalline TiN.The grain size became smaller and the columnar microstructure became looser.When the nitrogen flow comes to 20mL/min,the film shows the best hardness and bonding force.