促进静电纺丝支架中细胞渗透生长的研究进展

PROGRESS ON CELL INFILTRATION IN ELECTROSPUN SCAFFOLD

目的综述改进静电纺丝(简称电纺)技术促进支架内细胞渗透生长的研究进展。方法查阅近年有关改进电纺技术促进支架内细胞渗透生长的相关文献,对相关技术方法和促进支架内细胞渗透生长的效果进行回顾及综合分析。结果改进方法包括电纺参数调节、电纺支架加工修饰、细胞-支架复合物动态培养和其他方法等,但效果有限,仍需进一步优化。结论细胞在支架中的渗透生长在组织工程研究中意义重大,电纺技术应用瓶颈在于其致密排列的纤维和过小的腔隙孔径,限制了支架内细胞的渗透生长,多种改进技术的联合应用将是解决这一难题的方法。

Objective electrospun scaffold. Methods To introduce the research progress on the technique of improving cell infiltration in The recent original articles about improving cell infiltration in electrospun scaffold were extensively reviewed and analyzed. Results The technique includes regulation of the electrospun parameters, modification of electrospun scaffold, and dynamic culture of scaffold-cells composite etc. The effect is limited and most of them need further optimization. Conclusion Cell infiltration in electrospun scaffold is of great significance in tissue engineering application. The relatively high compressed density and small pore size have become the bottleneck problem that prevents cell infiltration and tissue ingrowth into the scaffold. The combination of different techniques will be more effective to overcome this problem.