大面积头罩上类金刚石薄膜均匀性研究

Research of uniformity of diamond-like carbon on extensive head covering

根据军用光学仪器对红外窗口薄膜厚度均匀性的特殊要求,采用Femm42软件对射频等离子体化学气相沉积系统中真空室内的电场进行模拟分析,通过改变DOME的高度,并加入一金属圆环,解决了头罩边缘脱膜的问题。并利用田口实验方法指导实验,以减少实验次数,尽快找出影响薄膜性能的主次条件,同时可以分析各工艺参数对结果的影响趋势,最终确定最佳的工艺参数,在大面积头罩上成功镀制了厚度均匀性小于3%,且能承受恶劣环境测试的类金刚石薄膜。

According to the special requirement of optical instrument to the uniformity of thin film thickness on infrared window, Femm42 software was adopted to analyze the potential in the vaccum of radio frequence plasma enhanced chemical vapor deposition system, by changing the height of DOME, and adding a metal ring behind the DOME, the problem of delamination on the edge of dome had solved. Taguchi experimental method was used to decrease times of experiment, at the same time, the secondary condition of effecting performance of thin film was found. The effects of the process parameters on the results of thin film thickness uniformity were analyzed. Finally, the optimal parameters had comfired. The DLC film that the uniformity is less; 3% and can endure the bad environment test had successfully prepared.