连续微光学元件在光刻胶上的面形控制

Profile Control of Continuous Relief MOE in Photoresist

介绍了连续微光学元件在光刻胶上的面形控制方法。分析了光刻胶及显影液在制作二元和连续元件中所存在的差别 ;导出具有倒易关系的浮雕深度表达式和适用的范围 ,并以此指导面形的控制 ,对光刻胶进行适当的改造以适应连续微光学元件的制作。本文还给出了实验验证 ,制作出了多种质量优良的连续微光学元件 ,并对典型元件的面形进行了评价。

The method on profile- control of micro- optic element in photoresist was present- ed.The difference between fabrication of binary optic element and that of continuous- relief MOE may not be ignored.A reciprocal equation among the depth,exposure,density of the developer and its etching time was inferred,with the appropriate conditions that proved to be useful for the MOE fabrications.The property and treatment of the photoresist were modi- fied in order to meet the conditions of the reciprocal equation.As the result,some MOEs having accurate depth and good surface performance,with the evaluation of a typical ele- ment,were shown.