柔性基底上直流磁控溅射沉积金属铝膜的研究

Research on Al Thin Films Deposited on the Flexible Base Materials

采用直流磁控溅射法在棉布、涤纶、芳纶织物上制备金属铝膜,研究了铝膜的沉积速率、组织结构和表面形貌。结果表明:在一定的范围内,沉积速率随溅射功率的增大近似呈线性增加,随溅射气压的增加先升后降;基底材料对铝膜的组织结构有较大影响,在涤纶和棉布上沉积的铝膜才呈现出典型的多晶态面心立方结构,在芳纶和涤纶上获得的铝膜较棉布上的铝膜更为均匀、致密;在一定范围内,溅射功率的增大有助于提高铝膜质量。

Al thin films were respectively deposited by DC magnetron sputtering on the flexible substrates, such as the polyester, the aramid and the cotton etc. The deposition rate, structure and surface morphology of the aluminum thin films were studied. The results show that the deposition rate increases almost linearly with increasing sputtering power in a certain range. On the other hand, the deposition rate increases with increasing working pressure then decreases when it came up to the maximum peak. The crystal structures of the films are influenced due to the different substrates. The films on the polyester and cotton only have typical polycrystalline face-centered cubic structure. The films on the aramid and polyester are more uniform density and the particles are smaller than the ones on the cotton. Within a certain range, the increase of the sputtering power does enhance the quality of the thin films.