半导体硅片清洗设备研究进展

The Advances in the Equipments of the Silicon Wafer Cleaning

阐述了半导体硅片清洗的一些重要设备。主要包括湿法化学清洗、兆声波清洗以及机械刷洗设备等常用的设备及配置,同时也介绍了近几年逐渐获得应用的清洗设备方面的技术创新。

This article mainly reported some important equipments of the silicon wafer cleaning. These equipments mainly include the wet chemical clean, single wafer rotary cleaning and brush scrubber cleaning equipment that is commonly used. And also introduces some innovation cleaning equipment that gradually obtained the application in the recent years.