玻璃基片上钽薄膜屈曲结构的边界效应研究

Edge Effect of Buckling Patterns in Ta films Deposited on Glass Substrates

利用直流磁控溅射方法在玻璃基片上沉积了金属钽薄膜,研究了边界效应对薄膜屈曲结构的影响。结果表明:制备态的钽薄膜包含较大的残余压应力,促使薄膜与基片脱层而形成屈曲结构;屈曲结构在薄膜边界处成核生长,并逐渐扩展到薄膜内部区域;在薄膜边界处,屈曲结构呈垂直边界的平行直线状条纹结构,随着距离的增加,屈曲结构逐渐分叉形成无规网格结构或电话线结构。利用薄膜的单轴应力和等双轴应力模型,对屈曲结构边界处的形貌特征进行了深入分析。

Tantalum （Ta） films are prepared on glass substrates by direct current magnetron sputtering method, and the edge effect of buckling patterns is investigated. The results show that the as-prepared Ta film contains a large compressive stress, which is relieved by detaching of the film ~om its substrate. The buckling patterns nu- cleate at the film edges and then propagate into the central regions of the sample. In the vicinity of the film edge, they generally fnst have a straight-sided shape perpendicular to the edge, and then transform into bifurca- tion and buckle network or telephone cord structures. Based on the uniaxial and equl-biaxdal stress model, the v morphological characteristics of the buckling patterns near the film edges have been analyzed in detail