纯银等离子体基离子注入Al层的成分及相分析

THE COMPOSITION AND PHASE ANALYSIS OF Al IMPLANTATION LAYER PREPARED BY AlPBII INTO SILVER

采用金属等离子体基离子注入的方法，在 Ａｇ基体上注入了 Ａｌ．用 Ｘ射线光电子能谱仪（ＸＰＳ）对注入层的 Ａｌ浓度一深度分布和化学态进行了分析．用ｘ射线衍射法（ＸＲＤ）对注入层和非平衡磁控溅射的则沉积层相组成进行了测定和比较，选用小掠射角（３°）ＸＲＤ对注入层的相组成进行了测定．结果表明，注入层中 Ａｌ浓度沿深度方向逐渐降低，表面有 Ａｇ原子存在；近表面处形成了 Ａｇ-Ａｌ固溶体并且出现了少量的 μ-Ａｇ３Ａｌ相；较深处有氧化铝的形成，出现 Ａｇ—Ａｌ固溶体、 μ—Ａｇ３Ａｌ相和氧化铝三相共存；更深处， Ａｌ含量很快下降， Ａｇ－Ａｌ固溶体消失，出现μＰ－Ａｇ３Ａｌ相和氧化铝共存 μ－Ａｇ３Ａｌ相为β－Ｍｎ复杂立方结构，可以在很宽的 Ａｌ含量范围内形成，而 Ａｌ沉积层中未出现

Al particles were implanted into Ag substrate by plasma based ion implantation with Al plasma (AIPBII). The depth profile and chemical state of Al in implantation layer were acquired by XPS. The phase composition of Al implantation layer and that of Al deposition layer by unbalance magnetron sputtering (UBMS) were determined and compared. The glanced X-ray distraction method (GXRD) was used to analysis the phase in the implantation layer in detail. The results showed the Al concentration along depth direction decreases gradually. Ag atoms can be found in the surface layer of implantation sample. The Ag-Al solid solution and a few μ-Ag3Al phase exist in this surface layer. In the deep layer of implanted sample aluminum oxide was found and coexists with Ag-Al solid solution and μ-Ag3Al. The Ag-Al solid solution disappears at the deeper layer when the Al concentration decreased rapidly, and μ-Ag3Al coexists with aluminum oxide. Ag3AI phase has β-Mn complex cubic structure and the Al concentration in Ag3AI phase fluctuates in a large range. No Ag3AI phase was found in the deposition layer of Al.