磁控溅射TiAlN薄膜的制备及性能研究

Study on Properties and Preparation of TiAlN Films by Unbalanced Magnetron Sputtering

采用闭合场非平衡磁控溅射离子镀的方法,在工具钢表面制备了TiAlN薄膜。运用EDS、XRD和SEM对薄膜的成分、组织结构和表面形貌进行了测试,此外,也测定了薄膜的表面显微硬度、摩擦系数。结果表明,不同硬度基体上的TiAlN薄膜成分相同,膜层致密;硬、软基体上薄膜的显微硬度最高可达到2 575 HV0.025和2 295 HV0.025,摩擦系数分别在0.45和0.50左右。

TiAIN films were prepared by closed field unbalanced magnetron sputtering ion plating on the surface of tool- steel. EDS, XRD and SEM were used to test the films＇ chemical composition, microstructure and surface morphology. In addition, the films＇ surface microhardness, bonding strength and friction coefficient were also determined. The experimental results indicate that the TiAIN films of different substrate hardness have dense film structure and the same chemical composition, the hard substrate microhardness of the film can reach 2 575 HV0.025 and soft substrate can be upto 2 295 HV0.025 with friction coefficients abouts 0.45 and 0.50 respectively.