Ta_2N-TiW-An复合导体研究

Study on Ta_2N-TiW-An Conductive Multi-Layer

Ｔａ２ Ｎ／ＴｉＷ／Ａｕ是目前国际上普遍采用的耐高温电阻／导带复合结构。对电阻温度系数（ＴＣＲ）的分析可确定溅射系统的工作点。总泄漏计算和驻留气体分析（ＲＧＡ）可有效评价溅射气氛，提高ＴｉＷ／Ａｕ的可靠性。通过腐蚀液的比较，确定了合适的各膜层的腐蚀液。

Ta2 N / TiW / A u is commonly used for thin film hybrid circuits, this kind of resistor barrier and conductor can endure high temperature up to 450 degrees centigrade. The working point can be defined by analyzing thermal coefficient of tantalum nitride resistors. The composition of residual gases in the vacuum chamber can be estimated with residual gases analyzer (RGA) and total leaking rate. This two methods can be used for promoting the reliability of TiW/Au film The suitable etching solution of different layers is defined.