低剂量长期砷暴露对HaCat细胞增殖及凋亡水平的影响

Influence of low level and long-term arsenite exposure to cell proliferation and apoptosis of HaCat cells

目的探讨低剂量长期砷暴露对HaCat细胞增殖及凋亡水平的影响。方法 HaCat细胞暴露于浓度为0、0.05、0.10μmol/L的NaAsO215周后,用直接细胞计数法计数对照组及染砷组细胞数,检测细胞增殖水平;用流式细胞仪测定10 000个细胞的细胞凋亡发生水平。结果各染砷组细胞增殖速率与对照组相比均显著增高(P<0.05),且0.10μmol/L组细胞增殖率(245.00±8.66)%显著高于0.05μmol/L组(165.00±15.00)%(P<0.05),细胞增殖水平与染砷剂量间呈显著剂量-效应关系;0.05μmol/L组(0.28±0.08)%及0.10μmol/L组(0.34±0.09)%细胞凋亡率均明显低于对照组(0.74±0.18)%(P<0.05)。结论长期低剂量砷暴露可使HaCat细胞的增殖能力明显增强,并诱导细胞凋亡率显著降低。

Objective To discuss the influence of low level and long - term arsenite exposure to cell proliferation and apoptosis of HaCat cells. Methods HaCat cells were exposed to arsenic （0,0.05,0. 10μmol/L） for 15 weeks, then cell numbers of each group were counted by direct cell count assay to detect the cell proliferation level. Ten thousand ceils were measured to detect the cell apoptosis level. Results The cell proliferation rate of arsenic exposed groups was significantly higher than that of control group （ P 〈 0.05 ） ; Cell proliferation rate of 0.1μmol/L group （ 245.00 ± 8.66 ） % was significantly higher than that of 0.05 μmol/L group （ 165.00 ± 15.00） % [ P 〈 0.05 ） ; Cell proliferation level increased significantly with a dose - effect relation; apoptosis rate of 0.05 μmol/L group （ 0.28 ± 0.08 ） % and 0.1 μmol/L group （ 0.34 ± 0.09 ） % were significantly lower than that of control group （ 0.74 ± 0.18 ） % （ P 〈 0.05 ）. Conclusion Low level and long term arsenite exposure induce increased cell proliferation and decreased apoptosis level in HaCat cells.