PVD法制备(Ti,Al)N涂层中残余应力对其质量的影响

Effects of Residual Stress on Quality of(Ti,Al)N Coatings Deposited by PVD Method

在国产离子镀和空心阴极离子镀复合镀膜机上,通过改变脉冲偏压值制备了(Ti,Al)N涂层。用X射线衍射仪对涂层的相组成进行了检测分析,并通过测得的衍射谱线计算了(Ti,Al)N涂层中的残余应力值;扫描电镜观察涂层表面微观形貌显示涂层表面存在"大颗粒"现象;用材料表面微纳米力学测试系统检测了涂层与基体间的结合力和涂层的硬度值。对涂层中残余应力与质量和性能之间关系的研究分析表明:(Ti,Al)N涂层中存在着残余压应力,且随脉冲偏压值的增加其值有先减小后增大的趋势;涂层中"大颗粒"现象随脉冲偏压值的提高能够显著得到减轻,涂层与基体间结合力得到提高,涂层的硬度值增大,涂层质量和力学性能均得到改善。

The （Ti,A1）N coatings were deposited at different bias voltage by ion plating assisted with hollow cathode facility produced in China. X-ray diffraction method was used to study the composition and residual stress of the （Ti, Al） N coatings. There were macro-particles on surface of （Ti, Al） N coatings analyzed by SEM. The adhesion and hardness of （Ti,Al）N coatings were tested by universal nano/micro material tester. The research results show that the residual compressive stress existed in the （Ti,Al）N coatings. Following the augment of bias voltage, the residual stress value decreased first and then increased. The macro-particles on coatings became weaken notably, the adhesion and hardness of （Ti,Al）N coatings increased, the quality and mechanical properties of the coatings were improved when the value of bias voltage enhanced.