衬底偏压对CrN／Si3N4纳米多层膜结构和力学性能的影响

Effects of Bias on Structure and Mechanical Properties of CrN/Si3N4 Nanolayered Coatings

采用磁控溅射法在不同基底偏压条件下制备了CrN／Si3N4纳米多层膜，用x射线衍射仪、原子力显微镜及纳米压痕仪表征，结果表明，衬底偏压对CrN／Si3N4纳米多层膜微观结构、界面结构、硬度和磨损性能有重要影响；漂浮电位时，导致多层膜界面粗糙，CrN呈（200）、（111）共同生长，硬度和弹性模量低；当偏压变化时，界面宽度和粗糙度变化不大，硬度和模量变化的主要原因是不同衬底偏压下的晶格畸变导致两层材料弹性模量变化和晶粒尺寸变化。与漂浮电位相比，涂层的屈服应力和断裂韧性有所增强。

CrN/Si3N4 multilayer coatings were deposited at different substrate bias by reactive magnetron sputtering. The results show that there are important effects for substrate bias on the microstructure, interface and mechanical properties of the coatings. The interface is more rough and the microstructure is （200） and （111） texture without substrate bias, and the CrN/Si3N4 muhilayer has a low hardness and modulus. The interface width and roughness become small with the increase of bias. The variation of hardness and modulus are attributed to the changes in grain size and modulus variation caused by crystalline distortion. Compared to sample without bias, the yield stress （resistance to plastic deformation） and fracture toughness （resistance to crack propagation） would be improved by substrate bias.