羟基磷灰石义眼台植入后义眼台暴露的处理

Management of exposure associated with orbital hydroxyapatite implants

目的 :探讨羟基磷灰石眶内义眼台植入后义眼台暴露的处理方法。方法 :回顾本中心 1994年 7月至 1998年 6月期间收治的羟基磷灰石义眼台暴露 41例的治疗方法及效果。结果 :义眼台暴露的发生时间为术后 7天至 6月 ,暴露范围为 2 mm至 15 mm,有15例义眼台暴露能自行愈合 ;2 6例需手术修补 ,其中 2例伴有慢性感染者需手术取出义眼台。结论 :义眼台暴露的处理可根据暴露范围采用不同方法处理 ,义眼台暴露范围在 5 mm以内的可采用保守治疗 ,暴露范围超过 10

Objectives:To investigate the management of implant exposure associated with the hydroxyapatite(HA)implants.Methods:Forty one cases with HA implant exposure were studied between July 1994 and June 1998.Results:The implant exposure occurred seven days to six months after implantation.The diameters of exposure were 2mm to 15mm.Fifteen cases with implant exposure were managed conservatively and the conjunctival dehiscence healed spontaneously,and 26 cases were managed by operation,of which two with chronic infection of the implants required removal of the implants.Conclusion:Different methods may be applied to manage HA implant exposure according to the sizes of exposure.Small defects(≤5mm)may be treated conservatively and larger defects(>10mm)should be active management as early as possible.