ZnS薄膜的溅射沉积及其XPS研究

Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film

用Ａｒ＋束溅射沉积技术在ＨｇＣｄＴｅ表面实现了ＺｎＳ的低温沉积．用Ｘ射线光电子能借（ＸＰＳ）对上述ＺｎＳ薄膜以及热蒸发ＺｎＳ薄膜中的Ｚｎ、Ｓ元素的化学环境进行了对比实验研究．实验表明：离子束溅射沉积ＺｎＳ薄膜具有很好的组份均匀性，未探测到元素Ｚｎ、Ｓ的沉积．

The ZnS film was grown on HgCdTe surface by using the low-temperature ion beam sputtering technique. Zn and S elements in the sputtering ZnS film sample were studied and compared with those in the evaporating ZnS film by using X-ray photoelectron spectroscopy (XPS) technique. It is proved that the constituent elements are homogeneous, and the deposition of element Zn, S cannot be detected in the sputtering ZnS film.