机械活化法制备WS_2纳米片

Preparation of WS_2 Nanoplates by Mechanical Activation Method

以WO3和硫为原料,采用机械活化法制备了2H-WS2纳米片;采用XRD、SEM、TEM等手段研究了反应温度、保温时间及退火条件对产物的影响,并分析了反应过程和机理。结果表明:此方法的硫化过程为一步式反应,球磨对这一过程起到了重要的作用;球磨后的WS2纳米片退火时会发生非典型的自组装,此过程受到退火温度的制约;球磨可以限制退火时薄片的聚合长大,从而得到均匀有序、厚度约30nm的WS2纳米片。

2H-WS2 nanoplates with thickness of 30 nm were obtained by a mechanical activation method using WO3 and sulfur as raw materials. The effects of temperature, preserving time and annealing conditions on products were characterized by XRD, SEM and TEM. The reaction process and reaction mechanism were analyzed. Results show that sulfurization was finished in only one step, and ball-milling played a crucial role in this reaction. A typical self-assembly step was realized in annealing process, and was controlled by the annealing temperature. In order to get homogeneous hexagonal WS2 nanoplates, ball-milling before annealing was necessary, which could prevent nanoplates from growing up.