期刊文献+

大口径KDP晶体折射率非均匀性检测 被引量:1

Measurement of refraction index inhomogeneity of large aperture KDP crystal
下载PDF
导出
摘要 KDP晶体的折射率不均匀性将导致光束的空间分布存在不同程度的相位失配,从而使得三倍频系统的转换效率下降。为了得到KDP晶体折射率非均匀性的高精度检测结果,基于正交偏振干涉法,采用ZYGO MST大口径干涉仪,测量得到了大口径KDP晶体折射率非均匀性分布,其测量精度达到10-7,并通过实验研究了晶体面形对测量结果的影响。对晶体e光折射率非均匀性的高精度检测,为大口径晶体材料生长工艺、加工工艺等改进和提高提供了定量的检测依据。 The refraction index inhomogeneity of KDP crystal can cause beam phase mismatch in spatial distribution, thus lead to decreasing conversion efficiency of the third-harmonic genera- tion system. In order to obtain the refraction index inhomogeneity of KDP crystal in high pre- cision, the orthogonal polarized interferometry (OPI) was adopted. Using the ZYGO large ap- erture interferometer, the refraction index inhomogeneity distribution of large size KDP crystal was attained, with the precision as high as 10.7 , the effect of crystal surface figure on the tes- ting result was also studied experimentally. The high precision measurement of the refraction index inhomogeneity of crystal provides quantitative measurement references for the improve- ment of growth and machining technique of large aperture crystal materials.
出处 《应用光学》 CAS CSCD 北大核心 2013年第2期300-303,共4页 Journal of Applied Optics
关键词 KDP 折射率非均匀性 晶体面形 KDP refraction index inhomogeneity crystal surface figure
  • 相关文献

参考文献11

  • 1MOOREN M H V, RASING T, BLUYSSEN H J A. Determination of type I phase matching angles and conversion efficiency in KTP[J]. Appl. Opt., 1995, 34(6): 934-937.
  • 2LI Chang-sheng. Optical stress sensor based on elec- tro-optic compensation for photoelastic birefringence ina single crystal[J]. Appl. Opt., 2011, 50(27): 5315-5320.
  • 3WANG Wei-chao, LIU Yu-jia, XI Peng, et al. Ori- gin and effect of high-order dispersion in ultrashort pulse multiphoton microscopy in the 10 fs regime[J]. Appl. Opt., 2010, 49(35): 6703-6709.
  • 4SCHOTT. Technical Information TIE-26: Homoge- neity of optical glass[R]. US:s. n] ,2004.
  • 5AI C, WYANT J C. Measurement of the inhomoge- neity of a window [J]. Optical Engineering, 1991, 30(9) : 1399-1404.
  • 6SCHWIDER J, BUROW R, ELSSNER K E, et al. Homogeneity testing by phase sampling interferome- try[J]. Appl. Opt., 1985, 24(18): 3059-3061.
  • 7郭培基,余景池,丁泽钊,孙侠菲.光学玻璃光学均匀性的绝对测量技术[J].激光杂志,2003,24(3):26-27. 被引量:13
  • 8林娟.大口径光学玻璃光学均匀性干涉绝对测量方法[J].应用光学,2008,29(1):120-123. 被引量:11
  • 9纪小辉,陈彤.基于光电技术的玻璃折射率测量[J].应用光学,2010,31(5):777-780. 被引量:6
  • 10王芳,粟敬钦,李恪宇,任寰,袁静.KDP晶体折射率不均匀性对三倍频转换效率的影响[J].强激光与粒子束,2007,19(5):746-749. 被引量:12

二级参考文献23

共引文献32

同被引文献3

  • 1N.P Zaitseva,J.J De Yoreo,M.R Dehaven,R.L Vital,K.E Montgomery,M Richardson,L.J Atherton.Rapid growth of large-scale (40–55 cm) KH 2 PO 4 crystals[J].Journal of Crystal Growth.1997(2)
  • 2J.J. De Yoreo,Z.U. Rek,N.P. Zaitseva,B.W. Woods.Sources of optical distortion in rapidly grown crystals of KH 2 PO 4[J].Journal of Crystal Growth.1996(1)
  • 3N.P. Zaitseva,L.N. Rashkovich,S.V. Bogatyreva.Stability of KH 2 PO 4 and K(H,D) 2 PO 4 solutions at fast crystal growth rates[J].Journal of Crystal Growth.1995(3)

引证文献1

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部