基底结构对纳米铜膜光电性能影响

Influence of substrate structure on photoelectricity of copper film prepared by magnetron sputtering

采用射频磁控溅射法,在涤纶机织布、纺粘非织造布、针织布、纤维膜表面沉积纳米铜薄膜,并用紫外-可见分光光度计与四探针测试仪测试样品透光和导电性能,用彩色摄像机观察溅射样品的表面形貌,用毛管流动孔隙仪测试不同基底孔隙大小及分布,并对结果进行比较分析。结果表明,基底布表面结构形貌与孔隙大小对样品光透射率、导电性能均产生影响。随基底布孔隙率的增加,样品透射率提高,导电性能减弱,针织布由于其松散的线圈结构使得其表面电阻难以测知。

Nanoscale copper films were produced on the surfaces of PET woven, knitted and nonwoven fabrics by RF （radio frequency） magnetron sputtering at room temperature, respectively. The color camera was used to observe the surface morphology of the samples. The light transmission and electrical conductivity of samples were measured by ultraviolet-visible spectrophotometer and four point resistance probes, capillary flow porome- ter was used to observe the pores of the substrates. The analysis revealed that the surface morphology and pores of the substrates had influences on their photoelectrieity. With the porosity of the substrates increasing, the ul- traviolet protection behaviour and conductivity of samples reduced.