电沉积法制备加速器生产^(64)Cu的镍靶

Preparation of Ni Target for Cyclotron-produced ^(64)Cu by Electrodeposition

为制备加速器生产64 Cu辐照用Ni靶,采用电沉积法研究了电沉积过程中影响Ni靶层质量和质量厚度的主要因素,确定了Ni靶制备工艺条件和参数,为Ni浓度40～50g/L,盐酸浓度0.05～0.5mol/L,电沉积温度20～50℃,搅拌器旋转速度150～350r/min,电流密度10～35mA/cm2。在此工艺条件下制备出的Ni靶件表面光滑、平整,靶层致密、牢固,可应用于回旋加速器生产64 Cu。

To prepare Ni target with high quality for producing 64Cu using cyclotron,the target preparation process by electro-deposition method was studied.The effects of main process parameters on the performance and mass thickness of Ni target were studied.Under the optimum conditions,namely 40-50 g/L of Ni2＋ concentration,0.05-0.5 mol/L of HCl concentration,10-35 mA/cm2 of current density,rotation rate of 150-350 r/min,at 20-50 ℃,a high quality（good uniformity and adherence） Ni target could be made successfully.