低浓度氯化物三价铬电沉积工艺及其特性的研究

A Study of Low Concentration Chloride Trivalent Chromium Electrodeposition Process and Its Features

首先,在过去工作的基础上,通过单因素实验和正交实验,确定了低浓度氯化物三价铬电沉积工艺的镀液组成及工艺条件。其次,研究了镀液成分和工艺条件对镀液及镀层性能的影响。最后,对工艺的维护与调整进行了初步探索。

Based on the work in the past, the bath composition and technological conditions of low concentration chloride trivalent chromium electrodeposition process were determined. The effects of bath composition and process conditions on the properties of the bath and coating were investigated. Finally, the maintenance and adjustment of the process were explored preliminarily.