塑料薄膜屏蔽材料的生产工艺

A Production Process of Plastic Film Shielding Materials

对塑料薄膜进行低温等离子体表面处理,磁控溅射Ni-Cr过渡层、Cu植晶层后再电镀,所得镀层致密且结合力好。讨论了等离子体处理时间、磁控溅射过渡层和植晶层对后续镀层结合力的影响。指出了镀镍的工艺条件控制对镀层应力的影响。采用该工艺制备的屏蔽材料质量轻、价格低、有较好的机械性能,在电磁屏蔽领域应用广泛。

The surface of the plastic film was treated by low temperature plasma, prepared with nickel-chrome transition layer and copper plant crystal layer by magnetron sputtering, and then electroplated, obtaining a compact coating with good binding force. The effects of plasma processing time, magnetron sputtering transition layer and plant crystal layer on the binding force of subsequent coating are discussed. The impact of nickel plating process condition control on the binding force of the coating is pointed out. The shielding materials prepared with this technology are light in weight and low in price; possess better mechanical properties, so have wide applications in electromagnetic interference shielding field.