低温法制备TiO_2薄膜及其光催化氧化法处理电镀含铬废水的研究

A Research on Low Temperature Preparation of TiO 2 Film and Photocatalytic Oxidation Treatment of Electroplating Wastewater Containing Chromium

采用微波辅助低温法在玻璃基片上制备TiO2薄膜。通过X射线衍射仪和扫描电子显微镜对其物相及显微结构进行了表征。通过光催化降解实际电镀含铬废水实验,以总铬的去除率来评价光催化剂的活性,探讨了光源、pH值、废水初始质量浓度、光照时间及薄膜层数对总铬的去除率的影响。结果表明:当废水初始质量浓度在1 500～2 500mg/L范围内,pH值为8,负载4层薄膜,紫外光(λ=254nm)照射3h时,光催化氧化效果最佳,总铬的去除率达到85.6%。

The TiO2 film was prepared on glass substrate with microwave-assisted low-temperature method. The phase and morphology of as-prepared samples were characterized by X-ray diffracmeter and scanning electron microscope. Through photocatalytic degradation experiment of actual electroplating wastewater containing chromium, with total chromium removal rate as the standard o{ evaluating photocata!.yst activity, the effects of light source, pH value, initial mass concentration of wastewater, light application time and number of film layers on total chromium removal rate were explored. The results indicate that when the initial mass concentration of wastewater is between 1 500 mg/L and 2 500 mg/L, pH 8, and ultraviolet light （λ= 254 nm） application time 3 hours, the effect of oxidation is the best, total chromium removal rate of wastewater reaching 85.6%.