电子束辐射聚合制备槲皮素-镍(Ⅱ)金属配位分子印迹聚合物及其识别性能研究

PREPARATION OF QUERCETIN-NI(Ⅱ) IMPRINTED POLYMER BY ELECTRON BEAM RADIATION POLYMERIZATION AND ITS RECOGNITION CHARACTERISTICS

以电子束为辐照射线源,采用辐射聚合法成功制备了槲皮素-Ni(Ⅱ)金属配位分子印迹聚合物.通过紫外光谱研究了槲皮素与Ni(Ⅱ)之间的配位结构、配位作用方式及配位比,并按照1∶2的比例形成稳定配合物,同时也验证了槲皮素、Ni(Ⅱ)及功能单体甲基丙烯酸三者发生了金属配位印迹作用.利用红外光谱对产物的结构进行了表征.透射电镜、扫描电镜、吸附动力学实验分别考察辐射剂量对聚合物的微观形貌、吸附动力学性能的影响,结果表明辐射剂量对印迹聚合物的吸附性能有显著影响.同时选择性吸附实验结果显示该印迹聚合物对槲皮素-Ni(Ⅱ)配合物表现出明显的吸附选择性和特异性,最大结合量可达82.22μmol/g.对黄芩素和柚皮素的吸附选择性较差,分离因子分别为3.915和5.443.

A series of molecularly imprinted polymers were polymerization of functional monomer （methacrylic dimethacrylate） in the presence of quercetin-Ni （ 11 acid） synthesized via the electron beam radiation and crosslinking agent （ethylene glycol ） as template and were used as a highly selective 1 ： 2 complex in the system. At the same time, the ternary complexation of quercetin, Ni（ H ） and methacrylic acid was verified by similar methods. The characterization of the molecularly imprinted polymer prepared and pure quercetin was analyzed by Fourier transform infrared spectra. The result indicated that the template molecule could be fixed in molecularly imprinted polymer and also could achieve being eluted. Furthermore,the transmission electron microscopy and adsorption dynamic experiments were used to characterize the effect of radiation dose on the morphology and adsorption capacity of molecularly imprinted polymer. The result showed that the three-dimensional cross-linked network structure of the molecularly imprinted polymer prepared in condition of 20 kGy radiation dose was more uniform, and the presence of these internal pores greatly increased the surface area of molecularly imprinted polymer and reduced the embedding of imprinting sites, which was conducive to adsorb the template molecule. In addition, the selective adsorption experiments showed that the molecularly imprinted polymer prepared exhibited significant adsorption selectivity for quercetin compared with the quercetin＇ s structural analogs （baicalein and naringenin） in the presence of Ni（ H ） and the max adsorption amount reached 82.22 μmol/g. The separation factors were 3. 915 and 5.443, respectively.