摘要
通过对制备工艺的摸索 ,制备出用于软X光激光实验的In衰减膜 ;利用α能谱测厚仪对In衰减膜的质量厚度进行了测量 ;通过俄歇电子谱并结合Ar离子刻蚀对In膜表面氧化及氧元素质量分数的深度分布进行了分析 .
Through the study of the technology, the attenuation indium foil for soft X-ray laser experiment was fabricated. The mass thickness of the In attenuation foil was measured by a vacuum α thickness measurement apparatus. The surface oxidizing of indium attenuation foil was studied through Auger electronic spectrum combined with Ar ion beam etching.
出处
《同济大学学报(自然科学版)》
EI
CAS
CSCD
北大核心
2000年第3期312-315,共4页
Journal of Tongji University:Natural Science
基金
青年激光技术基金资助项目
国家 86 3基金资助项目
关键词
俄歇电子谱
软X光激光
铟衰减膜
厚度测量
制备
In attenuation foil
α energy spectrum mass thickness apparatus
Auger electronic spectrum