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Characterization and Wettability of ZnO Film Prepared by Chemical Etching Method 被引量:1

Characterization and Wettability of ZnO Film Prepared by Chemical Etching Method
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摘要 ZnO thin films were prepared by a chemical etching method and their wettability was investigated. The structure and surface composition structure were characterized by means of scanning electron microscopy, X-ray photoelectronic spectrometry(XPS), X-ray diffraction(XRD) and Raman spectrometry. These analyses reveal that the etched films were large-scale micro-nanohierarchical structures composed of a Zn core and a ZnO coating. Superhy- drophobic surfaces with water contact angles of over 150~ were obtained by n-octadecanethiol(ODT) modification. The XPS and Raman results indicate that ODT molecules were bound to the ZnO surface with the S head group by forming Zn--S bond. ZnO thin films were prepared by a chemical etching method and their wettability was investigated. The structure and surface composition structure were characterized by means of scanning electron microscopy, X-ray photoelectronic spectrometry(XPS), X-ray diffraction(XRD) and Raman spectrometry. These analyses reveal that the etched films were large-scale micro-nanohierarchical structures composed of a Zn core and a ZnO coating. Superhy- drophobic surfaces with water contact angles of over 150~ were obtained by n-octadecanethiol(ODT) modification. The XPS and Raman results indicate that ODT molecules were bound to the ZnO surface with the S head group by forming Zn--S bond.
出处 《Chemical Research in Chinese Universities》 SCIE CAS CSCD 2013年第2期333-337,共5页 高等学校化学研究(英文版)
基金 Supported by the National Natural Science Foundation of China(No.50875108) and the Specialized Research Fund for the Doctoral Program of Higher Education of China(No.20100061110022).
关键词 ZNO Chemical etching MICRO-NANOSTRUCTURE Raman spectrometry WETTABILITY ZnO Chemical etching Micro-nanostructure Raman spectrometry Wettability
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