溅射功率和氧氩比对TiO_2薄膜亲水性的影响

The Influences of Oxygen-argon Ratio and Sputtering Power on the Hydrophilicity of TiO_2 Films

用直流磁控溅射制备TiO2薄膜,分析了氧氩比和溅射功率两项制备参数对退火后形成的锐钛矿二氧化钛薄膜亲水性的影响。实验结果表明,适中的氧氩比2∶3和功率126W下制备的薄膜具有很好的亲水性。

TiO2 thin films were prepared by direct current （DC） magnetron sputtering. The influences of oxy- gen-argon ratio and sputtering power on the hydrophi｜icity of TiOz thin films after annealed at air were studied by the variation of 1μL water diameter. The results show that thin films could achieve the best hydrophilicity on the condition of moderate oxygen-argon ratio of 2 ： 30 and DC power of 94W. The detail meChanism was analysed.