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Reactive Adsorption of Thiophene Using a NiZnO-Based Adsorbent

Reactive Adsorption of Thiophene Using a NiZnO-Based Adsorbent
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摘要 The thiophene removal ability of the synthesized NiZnO-based adsorbent was tested in a lab-scale fixed-bed system. The X-ray diffractometer (XRD) and the temperature-programmed reduction (H2-TPR) instrument were used to characterize the samples. The XRD and TPR results showed that there existed stronger synergetic effect between ZnO and NiO to form well-dispersed adsorbent particles when the Zn/Ni molar ratio in adsorbent was 0.4, and that the optimum temperature for reduction of the NiZnO-based adsorbent was approximately in the range of 350℃—400℃. In addition, the effects of reaction temperature, and reaction pressure on the reactive adsorption desulfurization tests were studied. The thiophene removal ability of the synthesized NiZnO-based adsorbent was tested in a lab-scale fixed-bed sys- tem. The X-ray diffractometer (XRD) and the temperature-programmed reduction (H2-TPR) instrument were used to char- acterize the samples. The XRD and TPR results showed that there existed stronger synergetic effect between ZnO and NiO to form well-dispersed adsorbent particles when the Zn/Ni molar ratio in adsorbent was 0.4, and that the optimum tempera- ture for reduction of the NiZnO-based adsorbent was approximately in the range of 350 ℃-400 ℃. In addition, the effects of reaction temperature, and reaction pressure on the reactive adsorption desulfurization tests were studied.
出处 《China Petroleum Processing & Petrochemical Technology》 SCIE CAS 2012年第4期28-32,共5页 中国炼油与石油化工(英文版)
关键词 reactive adsorption DESULFURIZATION THIOPHENE NIO ZNO 吸附剂 吸附活性 噻吩 X-射线衍射仪 程序升温还原 反应温度 实验室规模 X射线衍射
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