FFS产品树脂材料结构ITO刻蚀技术研究

ITO Etching in FFS Structure with Resin Material

树脂材料表面平坦度高,光透过率高,介电常数低(ε≈3.5),在薄膜晶体管显示器(TFT-LCD)中使用树脂材料作为钝化层,可以降低公共电极和源、漏金属之间的电容,降低逻辑功耗,达到降低整体功耗的目的,同时增大开口率。文章讨论在边缘场中引入树脂材料作为钝化层产生的与氧化铟锡(ITO)刻蚀相关问题:金属Mo腐蚀,ITO缺失等。通过优化刻蚀工艺,感光树脂与非感光树脂和ITO刻蚀液的搭配,以及改变树脂涂胶工艺,成功地将树脂引入TFT-LCD中。

The Acrylate resin layer has lower dielectric constant（ε≈3.5） ,better optical trans- parency, and can be spin-coated as a flat surface film easily. By using resin as passivation layer in the array process, the vertical gap is increased between the Common IT（） and bus line and plannar the devices. This reduces unwanted capacitive coupling and enables the pixel electrode to be extended over the gate and data lines, thus increasing aperture area, specifi- cally decreases power. In this work, there were some problems between the resin passivation layer and pixel ITO, such as Mo attack, missing ITO and so on. After optimizing the process of ITO Etching, photosensitive resin and non-photosensitive resin perfectly match with ITO etchant and Resin Coating, the resin passivation layer is sucessfully applied to the TFT -LCD. Key words,