基体负偏压对W-C-N薄膜摩擦磨损性能的影响

Effects of negative bias voltage on tribological properties of W-C-N thin films by magnetron sputtering

采用多靶反应磁控溅射设备制备了一系列不同基体负偏压的W-C-N复合膜。采用X射线衍射仪、扫描电镜、能量色散谱仪、纳米压痕仪和摩擦磨损仪对薄膜进行表征。结果表明:当负偏压小于等于80 V时,薄膜表现出六方α-WCN相结构,增加到120 V时,转变为立方β-WCN相,薄膜硬度、弹性模量和膜基结合力出现对应最佳性能点的峰值;随着负偏压的增大,薄膜质量得到改善,磨损率和摩擦系数明显降低,负偏压达到200 V时,磨损率和摩擦系数分别出现最低值4.22×10-6mm3.N-1.m-1和0.27;薄膜的磨损机制主要是磨粒磨损。

W-C-N nano-composite films were fabricated by reactive magnetron sputtering technique with different negative bias voltage （V_b） Microstructure and properties of the films were investigated by X-ray diffraction, scan electron microscopy, energy dispersive spectrometer, nano-indentor and tribometer. The results show that hexagonal α-WCN phase occurs in the films as V_b is lower than or equal to 80 V. However, as V_b further increases to 120 V, β-WCN forms. Raising V_b leads to increasing of hardness, elastic modulus and binding strength of the films to peak valuse. The inerease of V_bresults in improvement of surface quality and decrease of friction coefficient and wear rate for the W-C-N films. As V_b increases to 120 V, the films get the minimum wear rate and coefficient of friction ,which are 4.22×10^-6mm^3·N^-1·m^-1 and 0. 27, respectively. Abrasive wear is the main wear mechanism.